Marya Lieberman » Image Gallery
Nano-ND
Electron-beam lithography of a self-assembled monolayer produced this image. The dark lines are 60 nm wide and just 3 Å deep
Other Images
|
|
|
|
Contact Information
- Associate Professor
- Office: 271 Stepan
- Phone: 574.631.4665
- Contact by Email
- Group Website
